Ge and SiGe for High Performance MOSFETs and Integrated Optical Interconnects

Krishna C. Saraswat; Chi On Chui; Tejas Krishnamohan; Ali K. Okyay; Hyoungsub Kim; Paul McIntyre

doi:https://doi.org/10.7567/SSDM.2004.A-8-1

[A-8-1] Ge and SiGe for High Performance MOSFETs and Integrated Optical Interconnects

Krishna C. Saraswat、Chi On Chui、Tejas Krishnamohan、Ali K. Okyay、Hyoungsub Kim、Paul McIntyre (1.Department of Electrical Engineering, Stanford University、2.Department of Materials Science and Engineering, Stanford University)

https://doi.org/10.7567/SSDM.2004.A-8-1

2004 International Conference on Solid State Devices and Materials

[A-8-1] Ge and SiGe for High Performance MOSFETs and Integrated Optical Interconnects