[A-8-2] A Novel STI Process from the View Point of Total Strain Process Design for 45nm Node Devices and Beyond
M. Ishibashi, K. Horita, M. Sawada, M. Kitazawa, M. Igarashi, T. Kuroi, T. Eimori, K. Kobayashi, M. Inuishi, Y. Ohji
(1.Process Technology Development Div, Renesas Technology Corp.)
https://doi.org/10.7567/SSDM.2004.A-8-2
