The Japan Society of Applied Physics

[B-5-3] Effect of Fluorine on Interface Characteristics in Low-temperature CMIS Process with HfO2 Metal Gate Stacks

Takaoki SASAKI、Yasushi AKASAKA、Kazuhiro MIYAGAWA、Takeshi HOSHI、Yasuhiko WATANABE、Fumio OOTSUKA、Mitsuo YASUHIRA、Tsunetoshi ARIKADO (1.Semiconductor Leading Edge Technologies Inc.)

https://doi.org/10.7567/SSDM.2004.B-5-3