[B-5-3] Effect of Fluorine on Interface Characteristics in Low-temperature CMIS Process with HfO2 Metal Gate Stacks

Takaoki SASAKI, Yasushi AKASAKA, Kazuhiro MIYAGAWA, Takeshi HOSHI, Yasuhiko WATANABE, Fumio OOTSUKA, Mitsuo YASUHIRA, Tsunetoshi ARIKADO (1.Semiconductor Leading Edge Technologies Inc.)

https://doi.org/10.7567/SSDM.2004.B-5-3