[B-5-4] Behavior of Effective Work Function in Metal/High-K Gate Stack under High Temperature Process

Moon Sig Joo, Byung Jin Cho, D. Z. Chi, N. Balasubramanian, D.-L. Kwong (1.Silicon Nano Device Laboratory, Dept. of Electrical & Computer Engineering, NUS, 2.Institute of Microelectronics, 3.Dept. of ECE, University of Texas)

https://doi.org/10.7567/SSDM.2004.B-5-4