[B-5-4] Behavior of Effective Work Function in Metal/High-K Gate Stack under High Temperature Process

Moon Sig Joo、Byung Jin Cho、D. Z. Chi、N. Balasubramanian、D.-L. Kwong (1.Silicon Nano Device Laboratory, Dept. of Electrical & Computer Engineering, NUS、2.Institute of Microelectronics、3.Dept. of ECE, University of Texas)

https://doi.org/10.7567/SSDM.2004.B-5-4