[B-7-2] Hysteresis Phenomenon Improvements of HfO2 by CF4 Plasma Treatment

Chao Sung Lai、Woei Cherng Wu、Kung Ming Fan、Jer Chyi Wang、Shian-Jyh Lin (1.Department of Electronic Engineering, Chang Gung University、2.Nanya Technology Corp., Technology Process Development Department)

https://doi.org/10.7567/SSDM.2004.B-7-2