[C-5-3] A 90nm-node SOI Technology for RF Applications

Tatsuhiko Ikeda、Yuuichi Hirano、Toshiaki Iwamatsu、Daniel Chen、Tsutomu Yoshimura、Takashi Ipposhi、Shigeto Maegawa、Masahide Inuishi、Yuzuru Ohji (1.Advanced Device Development Dept., Renesas Technology Corp.、2.High Frequency & Optical Semiconductor Division, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.2004.C-5-3