[D-6-4] Noise Analysis of AlGaN/GaN MOS-HFETs with Photochemical-Vapor Deposition SiO2 Layer

Y. Z. Chiou、C. K. Wang、S. J. Chang、Y. K. Su、C. S. Chang、T. K. Lin、T. H. Fang、J. J. Tang (1.Department of Electronics Engineering, Southern Taiwan University of Technology、2.Institute of Microelectronics & Department of Electrical Engineering National Cheng Kung University)

https://doi.org/10.7567/SSDM.2004.D-6-4