[E-2-2] Influences of Traps within HfSiON Bulk on Positive- and Negative- Bias Temperature Instability of HfSiON Gate Stacks

Shinji Fujieda、Setsu Kotsuji、Ayuka Morioka、Masayuki Terai、Motofumi Saitoh (1.System Devices Research Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.2004.E-2-2