The Japan Society of Applied Physics

[F-10-2L] Low Temperature Solution Processed SiO2 Insulator Thin Films for Organic FET

Takehito Kodzasa、Manabu Yoshida、Sei Uemura、Satoshi Hoshino、Toshihide Kamata (1.Photonics Research Institute, National Institute of Advances Industrial Science and Technology)

https://doi.org/10.7567/SSDM.2004.F-10-2L