[F-4-5L] Layout dependence of RF CMOS performance on ultra-thin Si substrate
T. Ohguro, N. Sato, M. Matsuo, K. Kojima, H. S. Momose, K. Ishimaru, H. Ishiuchi
(1.SoC Research & Development Center, 2.Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company)
https://doi.org/10.7567/SSDM.2004.F-4-5L
