[H-3-5] Formation of Nanometer-Scale Dislocation Network Sandwiched by Silicon-on-Insulator Layers

Yasuhiko Ishikawa, Kazuaki Yamauchi, Hiroya Ikeda, Yukinori Ono, Masao Nagase, Michiharu Tabe (1.Research Institute of Electronics, Shizuoka University, 2.NTT Basic Research Laboratories, NTT Corporation)

https://doi.org/10.7567/SSDM.2004.H-3-5