[P2-11] Reduced Hot-Carrier Induced Degradation of NMOS I/O Transistors with Sub-micron Source-Drain Diffusion Length for 0.11 μm Dual Gate Oxide CMOS Technology

Kwang-Seng See, Wai-Shing Lau, Hong Liao, Jae Gon Lee, Elgin Kiok-Boone Quek, Kheng-Chok Tee, Lap-Hung Chan (1.School of Electrical and Electronic Engineering, Nanyang Technological University, 2.Department of Technology Development, Chartered Semiconductor Manufacturing Ltd)

https://doi.org/10.7567/SSDM.2004.P2-11