[P2-20] Novel Nitrogen doped Ni SALICIDE Process for Nano-Scale CMOS Technology

Soon-Young Oh、Jang-Gn Yun、Bin-Feng Huang、Yong-Jin Kim、Hee-Hwan Ji、Ui-Sik Kim、Han-Sub Cha、Sang-Bum Heo、Jeong-Gun Lee、Jin-Suk Wang、Hi-Deok Lee (1.Dept. of Electronics Engineering, Chungnam National University、2.System IC R&D Division, Hynix Semiconductor Inc.)

https://doi.org/10.7567/SSDM.2004.P2-20