The Japan Society of Applied Physics

[P2-20] Novel Nitrogen doped Ni SALICIDE Process for Nano-Scale CMOS Technology

Soon-Young Oh, Jang-Gn Yun, Bin-Feng Huang, Yong-Jin Kim, Hee-Hwan Ji, Ui-Sik Kim, Han-Sub Cha, Sang-Bum Heo, Jeong-Gun Lee, Jin-Suk Wang, Hi-Deok Lee (1.Dept. of Electronics Engineering, Chungnam National University, 2.System IC R&D Division, Hynix Semiconductor Inc.)

https://doi.org/10.7567/SSDM.2004.P2-20