[P3-1] The development of TiN Bottom Electrodes Isolation Methods for the Fabrication of sub-micron DRAM Capacitor

Yong-Tae Cho、Sang-Hoon Cho、Hae-Jung Lee、Suk-Ki Kim、Jong-Bum Park、Jong-Min Lee、Bong-Ho Choi、Jin-Woong Kim (1.HYNIX Semiconductor Inc., Memory R & D Division)

https://doi.org/10.7567/SSDM.2004.P3-1