[P3-11] Poly-Si Comparable Fermi-Level Pinning of Fully Silicided Platinum Gates on HfO2

M. Kadoshima、K. Akiyama、N. Mise、S. Migita、N. Yasuda、K. Iwamoto、H. Fujiwara、K. Tominaga、M. Ohno、T. Nabatame、A. Toriumi (1.MIRAI-ASET, AIST Tsukuba West 7、2.MIRAI-ASRC, AIST Tsukuba, Japan、3.Department of Materials Science, The University of Tokyo, Japan)

https://doi.org/10.7567/SSDM.2004.P3-11