[P3-11] Poly-Si Comparable Fermi-Level Pinning of Fully Silicided Platinum Gates on HfO2

M. Kadoshima, K. Akiyama, N. Mise, S. Migita, N. Yasuda, K. Iwamoto, H. Fujiwara, K. Tominaga, M. Ohno, T. Nabatame, A. Toriumi (1.MIRAI-ASET, AIST Tsukuba West 7, 2.MIRAI-ASRC, AIST Tsukuba, Japan, 3.Department of Materials Science, The University of Tokyo, Japan)

https://doi.org/10.7567/SSDM.2004.P3-11