[P3-6] Workfunction Tuning Using Various Impurities for Fully Silicided NiSi Gate

Kousuke Sano、Masaki Hino、Norihiro Ooishi、Kentaro Shibahara (1.Research Center for Nanodevices and Systems, Hiroshima University)

https://doi.org/10.7567/SSDM.2004.P3-6