[P3-6] Workfunction Tuning Using Various Impurities for Fully Silicided NiSi Gate

Kousuke Sano, Masaki Hino, Norihiro Ooishi, Kentaro Shibahara (1.Research Center for Nanodevices and Systems, Hiroshima University)

https://doi.org/10.7567/SSDM.2004.P3-6