[P3-7] Investigation of CVD-Co Silicidation for the Improvement of Contact Resistance

Hyun-Su Kim, Jong-Ho Yun, Kwang-Jin Moon, Woong-Hee Sohn, Seong-Hwee Cheong, Sug-Woo Jung, Gil-Heyun Choi, Se-Hoon Kim, Nam-Jin Bae, Sung-Tae Kim, U-In Chung, Joo-Tae Moon (1.Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., 2.CVD Division, COMTECS Co., Ltd.)

https://doi.org/10.7567/SSDM.2004.P3-7