[P3-7] Investigation of CVD-Co Silicidation for the Improvement of Contact Resistance

Hyun-Su Kim、Jong-Ho Yun、Kwang-Jin Moon、Woong-Hee Sohn、Seong-Hwee Cheong、Sug-Woo Jung、Gil-Heyun Choi、Se-Hoon Kim、Nam-Jin Bae、Sung-Tae Kim、U-In Chung、Joo-Tae Moon (1.Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.、2.CVD Division, COMTECS Co., Ltd.)

https://doi.org/10.7567/SSDM.2004.P3-7