The Japan Society of Applied Physics

[A-1-1] Current Status and Addressing the Challenges of Hf-based Gate Stack toward 45nm-LSTP Application

M. Niwa, R. Mitsuhashi, K. Yamamoto, S. Hayashi, Y. Harada, A. Rothchild, T. Hoffmann, S. Kubicek, S. De Gendt, M. Heyns, S. Biesemans, M. Kubota (1.Matsushita assignee at IMEC, 2.Semiconductor Company, Matsushita Electric Ind.,Co., Ltd., 3.IMEC vzw)

https://doi.org/10.7567/SSDM.2005.A-1-1