[A-1-1] Current Status and Addressing the Challenges of Hf-based Gate Stack toward 45nm-LSTP Application

M. Niwa、R. Mitsuhashi、K. Yamamoto、S. Hayashi、Y. Harada、A. Rothchild、T. Hoffmann、S. Kubicek、S. De Gendt、M. Heyns、S. Biesemans、M. Kubota (1.Matsushita assignee at IMEC、2.Semiconductor Company, Matsushita Electric Ind.,Co., Ltd.、3.IMEC vzw)

https://doi.org/10.7567/SSDM.2005.A-1-1