The Japan Society of Applied Physics

[A-2-4] NBTI Dependence on Dielectric Thickness in Ultra-scaled HfSiO Dielectric/ ALD-TiN Gate Stacks

Siddarth A. Krishnan, Manuel Quevedo, Rusty Harris, Paul D. Kirsch, Rino Choi, Byoung Hun Lee, Gennadi Bersuker, Jeff Peterson, Hong-Jyh Li, Chadwin Young, Jack C. Lee (1.SEMATECH, 2.TI, 3.AMD, 4.IBM and, 5.Infineon, 6.Professor, Electrical Engg. The University of Texas at Austin)