[A-7-3] Area Selective Flash Lamp Post-Deposition Annealing of High-k Film Using Si Photo Absorber for Metal Gate MISFETs with NiSi Source/Drain

Takeo Matsuki, Isamu Nishimura, Yasushi Akasaka, Kiyoshi Hayashi, Masataka Noguchi, Koji Yamashita, Kazuyoshi Torii, Naoki Kasai, Yasuo Nara (1.Research Department 1, Semiconductor Leading Edge Technologies, Inc., 2.Rohm, 3.Renesas, 4.NEC, 5.Sanyo, 6.Hitachi)

https://doi.org/10.7567/SSDM.2005.A-7-3