[C-2-1] Innovative Al Damascene Process for Nanoscale Interconnects

Kyung In Choi、Sung Ho Han、Sera Yun、Dae-Yong Kim、Jong Won Hong、Sang Woo Lee、Byung Hee Kim、Sung-Tae Kim、U In Chung、Joo Tae Moon (1.Process Development Team, Semiconductor R&D Center, Samsung Electronics Co. Ltd.)

https://doi.org/10.7567/SSDM.2005.C-2-1