[C-5-3] Adsorption in-situ Spectroscopic Ellipsometry Analysis of Disordered Porous Silica Low-k Films

Xianying Li, Nobutoshi Fujii, Nobuhiro Hata, Takamaro Kikkawa (1.ASRC, AIST, 2.MIRAI-ASET, 3.MIRAI-ASRC, AIST, 4.RCNS, Hiroshima U.)

https://doi.org/10.7567/SSDM.2005.C-5-3