[C-5-3] Adsorption in-situ Spectroscopic Ellipsometry Analysis of Disordered Porous Silica Low-k Films

Xianying Li、Nobutoshi Fujii、Nobuhiro Hata、Takamaro Kikkawa (1.ASRC, AIST、2.MIRAI-ASET、3.MIRAI-ASRC, AIST、4.RCNS, Hiroshima U.)

https://doi.org/10.7567/SSDM.2005.C-5-3