[C-7-4L] Low Resistance Ni Thin Film Deposition for Nickel Silicide by Atomic Layer Deposition

K. W. Do, C. M. Yang, I. S. Kang, K. M. Kim, K. H. Back, H. I. Cho, H. B. Lee, J. H. Lee, S. H. Hahm, S. H. Kong, J. H. Lee (1.School of Electrical Engineering and Computer Science, Kyungpook National University)

https://doi.org/10.7567/SSDM.2005.C-7-4L