[F-4-1] Creation of Strained and Relaxed SiGe films simultaneously through Ge condensation on SOI

M. Mukherjee-Roy、A. Agarwal、C.H. Tung、R. Kumar、L.K. Bera、N. Balasubramanian、D.L. Kwong (1.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2005.F-4-1