[F-4-1] Creation of Strained and Relaxed SiGe films simultaneously through Ge condensation on SOI

M. Mukherjee-Roy, A. Agarwal, C.H. Tung, R. Kumar, L.K. Bera, N. Balasubramanian, D.L. Kwong (1.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2005.F-4-1