[H-2-1] Nitride-based nonvolatile memory and role of SiON dielectric film for performance improvement

Tetsuya Ishimaru、Nozomu Matsuzaki、Takashi Hashimoto、Hitoshi Kume (1.Central Research Laboratory, Hitachi, Ltd.、2.Renesas Technology Corp.)

https://doi.org/10.7567/SSDM.2005.H-2-1