[H-2-1] Nitride-based nonvolatile memory and role of SiON dielectric film for performance improvement

Tetsuya Ishimaru, Nozomu Matsuzaki, Takashi Hashimoto, Hitoshi Kume (1.Central Research Laboratory, Hitachi, Ltd., 2.Renesas Technology Corp.)

https://doi.org/10.7567/SSDM.2005.H-2-1