[I-8-3] Noise Analysis of Nitride-based MOS-HFETs with Photo-chemical Vapor Deposition SiO2 Gate Oxide in the Linear and Saturation Region

Chun-Kai Wang, Shoou-Jinn Chang, Yan-Kuin Su, Yu-Zung Chiou, Tien-Kun Lin, Tsun-Kai Ko, Hsin-Liang Liu, Jing-Jou Tang (1.Institute of Microelectronics & Department of Electrical Engineering National Cheng Kung University, 2.Department of Electronics Engineering Southern Taiwan University of Technology)

https://doi.org/10.7567/SSDM.2005.I-8-3