[I-8-3] Noise Analysis of Nitride-based MOS-HFETs with Photo-chemical Vapor Deposition SiO2 Gate Oxide in the Linear and Saturation Region

Chun-Kai Wang、Shoou-Jinn Chang、Yan-Kuin Su、Yu-Zung Chiou、Tien-Kun Lin、Tsun-Kai Ko、Hsin-Liang Liu、Jing-Jou Tang (1.Institute of Microelectronics & Department of Electrical Engineering National Cheng Kung University、2.Department of Electronics Engineering Southern Taiwan University of Technology)

https://doi.org/10.7567/SSDM.2005.I-8-3