[P1-13] Overcoming Challenges in Metal Gate Etching for Sub-45 nm Technology Node

V. N. Bliznetsov, R. Kumar, L. K. Bera, W. Y. Loh, C. H. Tung, N. Balasubramanian, D. L. Kwong (1.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2005.P1-13