[P1-13] Overcoming Challenges in Metal Gate Etching for Sub-45 nm Technology Node

V. N. Bliznetsov、R. Kumar、L. K. Bera、W. Y. Loh、C. H. Tung、N. Balasubramanian、D. L. Kwong (1.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2005.P1-13