[P1-9] Reduction of Accumulation Thickness in Metal Gate

Hiroshi Watanabe, Kazuaki Nakajima, Kouji Matsuo, Tomohiro Saito, Takuya Kobayashi (1.Advanced LSI Technology Laboratory, Toshiba Corp., 2.Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.)

https://doi.org/10.7567/SSDM.2005.P1-9