The Japan Society of Applied Physics

[P3-18] A High Performance Embedded 60nm Gate Length CMOSFET with Novel Strained Silicon Process

Chih Jen Huang、K.Y. Chang、Sam Chou、Joe Koe、J. H. Huang、Hong Liao、C. Y. Lim (1.United Microelectronics Corp., Central Research & Development、2.United Microelectronics-Singapore Corp., Advanced Process Integration)

https://doi.org/10.7567/SSDM.2005.P3-18