[E-1-5] Thermally-stable gate technologies for InAlAs/InGaAs/InP HEMTs

Liang Wang、Weifeng Zhao、Ilesanmi Adesida (1.Dept. Materials Science & Engineering、2.Dept. Electrical & Computer Engineering, and、3.Micro & Nanotechnology Lab Univ. of Illinois)

https://doi.org/10.7567/SSDM.2006.E-1-5