[E-5-3] Ni(alloy)-germanosilicide contact technology for Si1-xGex (x=0.20-0.5) junctions

K.L. Pey, L.J. Jin, W. K. Choi, H. P. Yu, D. A. Antoniadis, E. A. Fitzgerald, D.Z. Chi, D. M. Isaacson (1.SMA, 2.Nanyang Technological University, 3.National University of Singapore, 4.MIT, 5.IMRE)

https://doi.org/10.7567/SSDM.2006.E-5-3