[E-5-3] Ni(alloy)-germanosilicide contact technology for Si1-xGex (x=0.20-0.5) junctions

K.L. Pey、L.J. Jin、W. K. Choi、H. P. Yu、D. A. Antoniadis、E. A. Fitzgerald、D.Z. Chi、D. M. Isaacson (1.SMA、2.Nanyang Technological University、3.National University of Singapore、4.MIT、5.IMRE)

https://doi.org/10.7567/SSDM.2006.E-5-3