[E-6-2] A Novel Laser Annealing Process for Advanced CMOS with Suppressed Gate Depletion and Ultr a-shallow Junctions

Akio Shima、Toshiyuki Mine、Lucia Feng、Xiaoru Wang、Yun Wang、Kazuyoshi Torii (1.Central Research Laboratory, Hitachi, Ltd.、2.Ultratech Inc.)

https://doi.org/10.7567/SSDM.2006.E-6-2