80nm T-Shaped Gate Metamorphic HEMTs fabricated Using Two-Step Gate Recess Process

Hyung Sup Yoon; Jae Yeob Shim; Dong Min Kang; Ju Yeon Hong; Kyung Ho Lee

doi:https://doi.org/10.7567/SSDM.2006.E-8-5

[E-8-5] 80nm T-Shaped Gate Metamorphic HEMTs fabricated Using Two-Step Gate Recess Process

Hyung Sup Yoon, Jae Yeob Shim, Dong Min Kang, Ju Yeon Hong, Kyung Ho Lee (1.RF Circuit Group, IT Convergence & Components Laboratory, Electronics and Telecommunications Research Institute)

https://doi.org/10.7567/SSDM.2006.E-8-5

2006 International Conference on Solid State Devices and Materials

[E-8-5] 80nm T-Shaped Gate Metamorphic HEMTs fabricated Using Two-Step Gate Recess Process