[E-8-5] 80nm T-Shaped Gate Metamorphic HEMTs fabricated Using Two-Step Gate Recess Process

Hyung Sup Yoon、Jae Yeob Shim、Dong Min Kang、Ju Yeon Hong、Kyung Ho Lee (1.RF Circuit Group, IT Convergence & Components Laboratory, Electronics and Telecommunications Research Institute)

https://doi.org/10.7567/SSDM.2006.E-8-5