The Japan Society of Applied Physics

[E-8-6] Comparative Study of DC and Microwave Characteristics of 0.12 μm T-Shaped Gate AlGaAs/InGaAs/GaAs PHEMTs Using a Hybrid and Conventional E-beam Lithography Process

Jong-Won Lim, Seok-Won Yoon, Ho-Kyun Ahn, Hong-Gu Ji, Woo-Jin Chang, Jae-Kyoung Mun, Haecheon Kim (1.IT Components & Materials Technology Research Division, IT Convergence & Components Laboratory, Electronics and Telecommunications Research Institute)