[F-1-1] Overview and Future Challenge of FeRAM Technologies

Y. Kato、Y. Kaneko、H. Tanaka、K. Kaibara、K. Isogai、Y. Shimada (1.Semiconductor Device Research Center, Matsushita Electric Industrial Co., Ltd、2.ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.2006.F-1-1