[F-2-3] Robust and Cost-Effective MIS-Al2O3/SiON Double-Layered Capacitor Technology for Sub-90 nm DRAMs

Osamu Tonomura, Hirotaka Hamamura, Hiroshi Miki (1.Central Research Laboratory, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.2006.F-2-3